School of Engineering \ Material Science and Nanotechnology Engineering
Course Credit
ECTS Credit
Course Type
Instructional Language
Programs that can take the course
Can be taken as faculty elective course by the other engineering departments
In this course, the most common techniques used in nanomaterial characterization are covered in detail. The techniques discussed include Auger Electron Spectroscopy (AES), X-ray Diffraction (XRD), X-ray Fluorescence (XRF), Energy Dispersive X-ray Spectroscopy (EDAX), Ultraviolet-Visible Spectroscopy (UV-Vis), Surface Plasmon Resonance (SPR), Infrared Spectroscopy (IR), Raman Spectroscopy, Nuclear Magnetic Resonance (NMR), Dynamic Light Scattering (DLS), Viscometry, Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM), and Atomic Force Microscopy (AFM).
Textbook and / or References
1. Skoog & West, Principles of Instrumental Analysis
2. Recent research articles and lecture notes
Learning methods that reveal the morphological, chemical, crystallographic, and surface properties of nanomaterials for characterization.
1. Understanding photoelectron-based characterization methods.
2. Learning X-ray generation and its use in analyzing crystallographic and surface properties.
3. Comprehending material-photon interactions and optical properties.
4. Understanding the principles of chemical characterization, molecular vibrations, and their interactions with electromagnetic radiation.
5. Learning the principles of morphological characterization using electron and force microscopy.
6. Forming groups to prepare and present a selected characterization method.
1. Introduction to Characterization and Photoelectron Spectroscopy Techniques
2. Auger Electron Spectroscopy (AES) and X-ray Diffraction (XRD) Techniques
3. X-ray Fluorescence (XRF) and Energy Dispersive X-ray Spectroscopy (EDAX)
4. Ultraviolet-Visible (UV-Vis) Spectroscopy
5. Surface Plasmon Resonance (SPR) and Infrared (IR) Spectroscopy
6. Fundamentals of Raman Spectroscopy
7. Nuclear Magnetic Resonance (NMR)
8. Dynamic Light Scattering (DLS)
9. Viscometry and Scanning Electron Microscopy (SEM)
10. Scanning Electron Microscopy (SEM) – Advanced Applications
11. Transmission Electron Microscopy (TEM)
12. Atomic Force Microscopy (AFM)
| Tentative Assesment Methods |
| Activities |
Number |
Weight (%) |
| Course Attendance/Participation |
- |
- |
| Laboratory |
- |
- |
| Application |
- |
- |
| Homework |
- |
- |
| Project |
- |
- |
| Presentation |
1 |
10% |
| Field Work |
- |
- |
| Internship |
- |
- |
| Course Boards |
- |
- |
| Quiz |
3 |
30% |
| Midterm Exam |
1 |
30% |
| Final Exam |
1 |
30% |
|
Total |
100% |
| Tentative ECTS-Workload Table |
| Activities |
Number/Weeks |
Duration (Hours) |
Workload |
| Course Hours (first 6 weeks) |
6 |
4 |
24 |
| Course Hours (last 6 weeks) |
6 |
3 |
18 |
| Laboratory |
- |
- |
- |
| Application |
- |
- |
- |
| Homework |
- |
- |
- |
| Project |
- |
- |
- |
| Presentation |
1 |
20 |
20 |
| Field Work |
- |
- |
- |
| Internship |
- |
- |
- |
| Course Boards |
- |
- |
- |
| Preparation for Quiz |
3 |
10 |
30 |
| Preparation for Midterm Exam |
1 |
30 |
30 |
| Final Exam |
1 |
2 |
2 |
| Preparation for Final Exam |
1 |
30 |
30 |
| Study Hours Out of Class (preliminary work, reinforcement, etc.) |
12 |
1 |
12 |
| Total Workload | | |
166 |
| Total Workload / 30 | | |
166 / 30 |
| | |
5.533333 |
| ECTS Credits of the Course | | |
6 |
|
Program Outcome
**
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| 1 |
2 |
3 |
4 |
5 |
6 |
7 |
8 |
9 |
10 |
11 |
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Course Outcome
|
|---|
| 1 |
B, C
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B
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| 2 |
B, C
|
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B
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| 3 |
B, C
|
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B
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| 4 |
B, C
|
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B
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| 5 |
B, C
|
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B
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| 6 |
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A
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B
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